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The achievement marks a major milestone of imec and KMLabs’ AttoLab.
February 10, 2021
By: Anthony Locicero
Copy editor, New York Post
Imec reported for the first time the use of a 13.5 nm High Harmonic Generation source for the printing of 20nm pitch line/spaces using interference lithographic imaging of an Inpria metal-oxide resist under high-numerical-aperture (high-NA) conditions. The demonstrated high-NA capability of the EUV interference lithography using this EUV source presents an important milestone of the AttoLab, a research facility initiated by imec and KMLabs to accelerate the development of the high-NA patt...
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